publications

  1. A. Yanguas-Gil and J. W. Elam, Self-limited reaction-diffusion in nanostructured substrates: surface coverage dynamics and analytic approximations to ALD saturation times, Chemical Vapor Deposition, Accepted (2012).
  2. A. Yanguas-Gil and J. W. Elam, Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor, J. Vac. Sci. Technol. A 80, 01A159 (2012).
  3. A. Yanguas-Gil and J. W. Elam, Diffusion-Reaction Model of ALD in Nanostructured Substrates: Analytic Approximations to Dose Times as a Function of the Surface Reaction Probability, ECS Transactions 41, 169 (2011).
  4. A. Yanguas-Gil, K. E. Peterson and J. W. Elam, Controlled dopant distribution and higher doping efficiencies by surface-functionalized atomic layer deposition, Chemistry of Materials 23, 4295 (2011).
  5. A. Yanguas-Gil, B. A. Sperling and J. R. Abelson, Theory of light scattering from self-affine surfaces: Relationship between surface morphology and effective medium roughness, Physical Review B 84 (8), 085402 (2011).
  6. A. Yanguas-Gil and J. W. Elam, Growth Rate Control in ALD by Surface Functionalization: Alkyl Alcohols on Metal Oxides, ECS Transactions 33 (2), 333 (2010).
  7. A. von Keudell, P. Awakowicz, J. Benedikt, V. Raballand, A. Yanguas-Gil, et al. , Inactivation of Bacteria and Biomolecules by Low-Pressure Plasma Discharges, Plasma Processes and Polymers 7 (3-4), 327 (2010).
  8. A. Yanguas-Gil, Y. Yang, N. Kumar and J. R. Abelson, Highly conformal film growth by chemical vapor deposition. I. A conformal zone diagram based on kinetics, Journal of Vacuum Science & Technology A 27 (5), 1235 (2009).
  9. A. Yanguas-Gil, N. Kumar, Y. Yang and J. R. Abelson, Highly conformal film growth by chemical vapor deposition. II. Conformality enhancement through growth inhibition, Journal of Vacuum Science & Technology A 27 (5), 1244 (2009).
  10. N. Kumar, A. Yanguas-Gil, S. R. Daly, G. S. Girolami and J. R. Abelson, Remote plasma treatment of Si surfaces: Enhanced nucleation in low-temperature chemical vapor deposition, Applied Physics Letters 95 (14), 144107 (2009).
  11. M. Schulze, A. Yanguas-Gil, A. von Keudell and P. Awakowicz, A robust method to measure metastable and resonant state densities from emission spectra in argon and argon-diluted low pressure plasmas, Journal of Physics D-Applied Physics 41 (6), 065206 (2008).
  12. N. Kumar, A. Yanguas-Gil, S. R. Daly, G. S. Girolami and J. R. Abelson, Growth Inhibition to Enhance Conformal Coverage in Thin Film Chemical Vapor Deposition, Journal of the American Chemical Society 130 (52), 17660 (2008).
  13. A. Yanguas-Gil, K. Focke, J. Benedikt and A. von Keudell, Optical and electrical characterization of an atmospheric pressure microplasma jet for Ar/CH4 and Ar/C2H2 mixtures, Journal of Applied Physics 101 (10), 103307 (2007).
  14. A. Yanguas-Gil, J. Cotrino, A. Walkiewicz-Pietrzykowska and A. R. Gonzalez-Elipe, Scaling behavior and mechanism of formation of SiO2 thin films grown by plasma-enhanced chemical vapor deposition, Physical Review B 76 (7), 075314 (2007).
  15. A. Yanguas-Gil, J. Cotrino and A. R. Gonzalez-Elipe, Global model of a low pressure ECR microwave plasma applied to the PECVD of SiO(2) thin films, Journal of Physics D-Applied Physics 40 (11), 3411 (2007).
  16. A. von Keudell, I. Kim, A. Consoli, M. Schulze, A. Yanguas-Gil and J. Benedikt, The search for growth precursors in reactive plasmas: from nanoparticles to microplasmas, Plasma Sources Science & Technology 16 (1), S94 (2007).
  17. D. Dudeck, A. Yanguas-Gil, F. Yubero, J. Cotrino, J. P. Espinos, W. de la Cruz and A. R. Gonzalez-Elipe, First nucleation steps during deposition of SiO2 thin films by plasma enhanced chemical vapour deposition, Surface Science 601 (10), 2223 (2007).
  18. J. Chaboy, A. Barranco, A. Yanguas-Gil, F. Yubero and A. R. Gonzalez-Elipe, SiK-edge XANES study of SiOxCyHz amorphous polymeric materials, Physical Review B 75 (7), 075205 (2007).
  19. A. Borras, A. Yanguas-Gil, A. Barranco, J. Cotrino and A. R. Gonzalez-Elipe,Relationship between scaling behavior and porosity of plasma-deposited TiO(2) thin films, Physical Review B 76 (23), 235303 (2007).
  20. J. Benedikt, V. Raballand, A. Yanguas-Gil, K. Focke and A. von Keudell, Thin film deposition by means of atmospheric pressure microplasma jet, Plasma Physics and Controlled Fusion 49 (12B), B419 (2007).
  21. A. Barranco, F. Aparicio, A. Yanguas-Gil, P. Groening, J. Cotrino and A. R. Gonzalez-Elipe, Optically active thin films deposited by plasma polymerization of dye molecules, Chemical Vapor Deposition 13 (6-7), 319 (2007).
  22. A. Yanguas-Gil, J. Cotrino and A. R. Gonzalez-Elipe, Measuring the electron temperature by optical emission spectroscopy in two temperature plasmas at atmospheric pressure: A critical approach, Journal of Applied Physics 99 (3), 033104 (2006).
  23. A. Yanguas-Gil, J. Cotrino, A. Barranco and A. R. Gonzalez-Elipe, Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films, Physical Review Letters 96 (23), 236101 (2006).
  24. A. Yanguas-Gil, A. Barranco, J. Cotrino, P. Groning and A. R. Gonzalez-Elipe, Plasma characterization of oxygen-tetramethylsilane mixtures for the plasma-enhanced CVD of SiOxCyHz thin films, Chemical Vapor Deposition 12 (12), 728 (2006).
  25. J. Benedikt, K. Focke, A. Yanguas-Gil and A. von Keudell,Atmospheric pressure microplasma jet as a depositing tool, Applied Physics Letters 89 (25), 251504 (2006).
  26. A. Barranco, A. Yanguas-Gil, F. Yubero and A. R. Gonzalez-Elipe, Analysis of SiOxCyHz polymeric materials by x-ray absorption spectroscopy: Anomalous behavior of the resonant SiKLL Auger spectra, Journal of Applied Physics 100 (3), 033706 (2006).
  27. A. Yanguas-Gil, J. Cotrino, F. Yubero and A. R. Gonzalez-Elipe, Growth mechanisms of SiO2 thin films prepared by plasma enhanced chemical vapour deposition, Surface & Coatings Technology 200 (1-4), 881 (2005).
  28. A. Yanguas-Gil, J. Cotrino and A. R. Gonzalez-Elipe, Influence of the excited states on the electron-energy distribution function in low-pressure microwave argon plasmas, Physical Review E 72 (1), 016401 (2005).
  29. A. Yanguas-Gil, J. Cotrino and L. L. Alves, An update of argon inelastic cross sections for plasma discharges, Journal of Physics D-Applied Physics 38 (10), 1588 (2005).
  30. A. Yanguas-Gil, J. L. Hueso, J. Cotrino, A. Caballero and A. R. Gonzalez-Elipe, Reforming of ethanol in a microwave surface-wave plasma discharge, Applied Physics Letters 85 (18), 4004 (2004).
  31. A. Yanguas-Gil, J. Cotrino and A. R. Gonzalez-Elipe, Collisional radiative model of an argon atmospheric capillary surface-wave discharge, Physics of Plasmas 11 (12), 5497 (2004).

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